- Ultrapure Water Equipment
Consistently delivers high-quality ultrapure water
Used in semiconductors, microelectronics, display panels, optoelectronic materials, new energy, laboratories and other industries to produce ultrapure water with resistivity of 15–18 MΩ·cm.
- Water Quality
Compliant with industry standards including ASTM D5127, SJ/T 11636-2016, GB/T 11446.1-2013 and SEMI F63.
- Equipment Features
Integrated design, modular installation, fully automatic control, small footprint, stable product water quality, and simple operation and maintenance.
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Process Flow
1.Pretreatment + Single Pass Reverse Osmosis (RO) + Electrodeionization (EDI)
2.Pretreatment + Single Pass Reverse Osmosis (RO) + Electrodeionization (EDI) + Polishing Mixed Bed / Terminal Ultrafiltration
3.Pretreatment + Single Pass Reverse Osmosis (RO) + Double Pass Reverse Osmosis (DRO) + Electrodeionization (EDI) + Polishing Mixed Bed / Terminal Ultrafiltration
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Process Characteristics
1.Adopts the standard “RO + EDI” combination, which is mature, economical and widely recognized as a mainstream ultrapure water production solution.
2.Adds a polishing unit at the end of the basic process to provide ultimate purity guarantee for key water points.
3.Enhances pretreatment with “double-pass RO” to form a full-process deep purification system, achieving the highest level of water quality stability and reliability.
Note: the system is equipped with a comprehensive water quality monitoring system that monitors and adjusts water quality parameters in real time to ensure stable and continuous ultrapure water supply.
